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公司名稱
台灣積體電路製造股份有限公司
工作地點
台灣
專業領域
研究發展
職別
主管職
職務類型
正職
職務張貼日
2023/09/28
職務說明
The role is responsible for next generation tool development of mask inspection and recipe build-up/ capability verification for below 2nm Lithograph technology requirement.

職務要求
1. Master's Degree or above in EE, physics or related fields.
2. 3~5 years of experience in optical tool design or image algorithm/modeling.
3. Strong Laser physics, Plasma Physics, or e-beam system background is preferred.
4. Good project management, communications, organized thinking, leadership and interpersonal skills.
5. Proactive and positive attitude to deal with workplace challenges.